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Amino‐rich Plasma Polymer Films Prepared by RF Magnetron Sputtering
Author(s) -
Hanuš Jan,
Ceccone Giacomo,
Rossi François
Publication year - 2012
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201100137
Subject(s) - quartz crystal microbalance , isoelectric point , adsorption , materials science , sputter deposition , polymer , quartz , cavity magnetron , analytical chemistry (journal) , chemical engineering , thin film , sputtering , chemistry , chromatography , composite material , organic chemistry , nanotechnology , engineering , enzyme
Radio frequency magnetron sputtering of nylon 6.6 followed by N 2 /H 2 plasma post‐treatment was used for deposition of nitrogen‐rich film with amino functionalities on the surface. The maximal NH 2 /C concentration obtained was 11% and the NH 2 /N reached 13.5%. The films are positively charged with an isoelectric point of 4.5. The interaction between the film and the buffer solution was studied and shows that the films are stable in cell culture conditions. A quartz crystal microbalance study showed the ability of the films to adsorb different proteins and their antigens and quantifies the protein adsorbed as a function of the films properties.