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Characterization of a Low‐pressure Inductively Coupled Plasma Discharge Sustained in Ar/O 2 /N 2 Ternary Mixtures and Evaluation of its Effect on Erosion of Biological Samples
Author(s) -
Kylián Ondřej,
Denis Benjamin,
Stapelmann Katharina,
Ruiz Ana,
Rauscher Hubert,
Rossi Francois
Publication year - 2011
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201100086
Subject(s) - ternary operation , inductively coupled plasma , plasma , analytical chemistry (journal) , characterization (materials science) , materials science , inductively coupled plasma atomic emission spectroscopy , chemistry , environmental chemistry , nanotechnology , physics , quantum mechanics , computer science , programming language
Detailed characterization of a low‐pressure inductively coupled plasma discharge sustained in an Ar/O 2 /N 2 ternary mixture is performed in this study. The main attention is devoted to the evaluation of the dependence of parameters important for treatment of biological samples (emission of UV radiation, plasma density, energy of charged particles, O atoms density, and substrate heating) on the working gas mixture composition. Subsequently, the capability of plasma sustained in ternary gas mixture to effectively etch biological contaminants is tested on examples of bacterial spores and poly‐ L ‐histidine.