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Plasma Deposition of Nanoscale Difluoromethylene Dominated Surfaces
Author(s) -
Quade Antje,
Schröder Karsten,
Ohl Andreas,
Weltmann KlausDieter
Publication year - 2011
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201100019
Subject(s) - polytetrafluoroethylene , wetting , materials science , microwave , deposition (geology) , chemical vapor deposition , nanoscopic scale , fourier transform infrared spectroscopy , analytical chemistry (journal) , absorption (acoustics) , contact angle , chemical engineering , infrared spectroscopy , nanotechnology , composite material , chemistry , organic chemistry , paleontology , physics , quantum mechanics , sediment , engineering , biology
Polytetrafluoroethylene‐like coatings with a remarkably high amount of CF 2 groups to the extent of 85% were deposited with a pulsed microwave discharge at low pressure. They were obtained by plasma enhanced chemical vapor deposition using solely octafluoropropane gas, C 3 F 8 , as precursor. The influence of gas pressure and microwave power on properties of the deposited coatings like content of CF 2 ‐chains, F/C‐ratio, deposition rate, and wettability is described. Best results regarding a high difluoromethylene group content of the films were obtained at a pressure of 50 Pa at higher microwave powers. FTIR spectra show the two distinct absorption bands, which are assigned to the CF 2 asymmetric and symmetric stretching modes, demonstrating convincingly the nature of the highly ordered PTFE‐like films.