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Plasma Process. Polym. 8/2010
Author(s) -
Beyene Haile Takele,
Tichelaar Frans D.,
Peeters Paul,
Kolev Ivan,
van de Sanden Mauritius C. M.,
Creatore Mariadriana
Publication year - 2010
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201090015
Subject(s) - materials science , nanoparticle , plasma , sputter deposition , deposition (geology) , layer (electronics) , dielectric , metal , sputtering , thermal , optoelectronics , nanotechnology , thin film , analytical chemistry (journal) , chemical engineering , chemistry , metallurgy , chromatography , physics , engineering , paleontology , quantum mechanics , sediment , biology , meteorology
Cover: Hybrid remote expanding thermal plasma CVD/RF magnetron sputtering system to produce metallic nanoparticles dispersed on the surface of a dielectric layer. The shape, size, size distribution and area coverage of the metallic nanoparticles are controlled by the RF‐power, expanding thermal plasma parameters and time of deposition. Further details can be found in the article by H. T. Beyene, * F. D. Tichelaar, P. Peeters, I. Kolev, M. C. M van de Sanden, and M. Creatore on page 657 .