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Plasma Process. Polym. 6/2010
Author(s) -
GirardLauriault PierreLuc,
Retzko Iris,
Swaraj Sufal,
Matsubayashi Nobuyuki,
Gross Thomas,
Mix Renate,
Unger Wolfgang E. S.
Publication year - 2010
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201090012
Subject(s) - x ray photoelectron spectroscopy , acrylic acid , synchrotron radiation , plasma , excitation , cover (algebra) , analytical chemistry (journal) , materials science , chemistry , chemical engineering , polymer chemistry , composite material , optics , organic chemistry , polymer , physics , engineering , nuclear physics , mechanical engineering , electrical engineering , monomer
Back Cover: XPS using synchrotron radiation enables different information depths by variation of the excitation energy. Non‐destructive chemical depth profiling of a plasma polymerised acrylic acid (ppAAc) film within the outermost 10 nm is possible. Spectra demonstrate surface‐near depletion in acid and/or ester groups. Further details can be found in the article by P.‐L. Girard‐Lauriault, I. Retzko, S. Swaraj, N. Matsubayashi, T. Gross, R. Mix, W. E. S. Unger* on page 474 .