Plasma Process. Polym. 6/2010 | Zendy

GirardLauriault PierreLuc | Zendy; Retzko Iris | Zendy; Swaraj Sufal | Zendy; Matsubayashi Nobuyuki | Zendy; Gross Thomas | Zendy; Mix Renate | Zendy; Unger Wolfgang E. S. | Zendy

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Plasma Process. Polym. 6/2010

Author(s) -

GirardLauriault PierreLuc,

Retzko Iris,

Swaraj Sufal,

Matsubayashi Nobuyuki,

Gross Thomas,

Mix Renate,

Unger Wolfgang E. S.

Publication year - 2010

Publication title -

plasma processes and polymers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.644

H-Index - 74

eISSN - 1612-8869

pISSN - 1612-8850

DOI - 10.1002/ppap.201090012

Subject(s) - x ray photoelectron spectroscopy , acrylic acid , synchrotron radiation , plasma , excitation , cover (algebra) , analytical chemistry (journal) , materials science , chemistry , chemical engineering , polymer chemistry , composite material , optics , organic chemistry , polymer , physics , engineering , nuclear physics , mechanical engineering , electrical engineering , monomer

Back Cover: XPS using synchrotron radiation enables different information depths by variation of the excitation energy. Non‐destructive chemical depth profiling of a plasma polymerised acrylic acid (ppAAc) film within the outermost 10 nm is possible. Spectra demonstrate surface‐near depletion in acid and/or ester groups. Further details can be found in the article by P.‐L. Girard‐Lauriault, I. Retzko, S. Swaraj, N. Matsubayashi, T. Gross, R. Mix, W. E. S. Unger* on page 474 .

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