Premium
Combination of FTIR Reflection Absorption Spectroscopy and Work Function Measurements for In Situ Studies of Plasma Modified Passive Films on MgZn 2
Author(s) -
Giza Miroslaw,
Grundmeier Guido
Publication year - 2011
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201000198
Subject(s) - work function , x ray photoelectron spectroscopy , materials science , coating , kelvin probe force microscope , analytical chemistry (journal) , fourier transform infrared spectroscopy , oxide , absorption (acoustics) , chemical state , absorption spectroscopy , plasma , chemical engineering , layer (electronics) , chemistry , composite material , nanotechnology , metallurgy , optics , organic chemistry , physics , quantum mechanics , engineering , atomic force microscopy
The chemical and electronic properties of passive films on a ZnMg alloy coating can strongly influence the cathodic de‐adhesion process of an applied polymeric coating. Chemical composition of the atmospheric passive film on MgZn 2 was compared to the surface state after sequences of Ar/H 2 and oxygen plasma treatments by means of in situ IRRAS and ex situ XPS. It could be shown that the chemical composition of the passive film and its electronic properties as displayed by its work function could be significantly changed by the applied plasma processes. As analyzed by Kelvin probe measurements the surface potential could be shifted cathodically by the reductive plasma and anodically by the oxidative plasma. The very negative potentials led to polymer/oxide/metal interface potential more negative than the free corrosion potential of MgZn 2 . Thereby, a cathodic de‐adhesion process could be perfectly inhibited.