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Heating and Plasma Sheath Effects in Low‐Temperature, Plasma‐Assisted Growth of Carbon Nanofibers
Author(s) -
Mehdipour Hamid,
Ostrikov Kostya Ken,
Rider Amanda E.,
Han Zhaojun
Publication year - 2011
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201000150
Subject(s) - plasma , carbon nanofiber , materials science , electron temperature , substrate (aquarium) , ion , carbon fibers , analytical chemistry (journal) , nanotechnology , chemistry , carbon nanotube , composite material , chromatography , organic chemistry , physics , composite number , oceanography , quantum mechanics , geology
Abstract Plasma sheath, nanostructure growth, and thermal models are used to describe carbon nanofiber (CNF) growth and heating in a low‐temperature plasma. It is found that when the H 2 partial pressure is increased, H atom recombination and H ion neutralization are the main mechanisms responsible for energy release on the catalyst surface. Numerical results also show that process parameters such as the substrate potential, electron temperature and number density mainly affect the CNF growth rate and plasma heating at low catalyst temperatures. In contrast, gas pressure, ion temperature, and the C 2 H 2 :H 2 supply ratio affect the CNF growth at all temperatures. It is shown that plasma‐related processes substantially increase the catalyst particle temperature, in comparison to the substrate and the substrate‐holding platform temperatures.