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Surface Morphology in the Early Stages of Plasma Polymer Film Growth from Amine‐Containing Monomers
Author(s) -
Michelmore Andrew,
Martinek Petr,
Sah Vasu,
Short Robert D.,
Vasilev Krasimir
Publication year - 2011
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201000140
Subject(s) - x ray photoelectron spectroscopy , polymer , allylamine , wafer , plasma , silicon , deposition (geology) , monomer , amine gas treating , analytical chemistry (journal) , materials science , atomic force microscopy , chemistry , chemical engineering , polymer chemistry , nanotechnology , organic chemistry , physics , paleontology , polyelectrolyte , quantum mechanics , sediment , engineering , biology
The manner by which plasma polymers grow in the very first stages of deposition is a topic which has been almost overlooked. We show using atomic force microscopy (AFM) and X‐ray photoelectron spectroscopy (XPS) that in the early stages of plasma deposition there are significant differences in the way plasma polymers grow from two amine‐containing compounds onto silicon wafers. By AFM it is shown that films grown from n ‐heptylamine (HA) initially show ‘island‐like’ growth before a continuous smooth film is formed. In contrast, films from allylamine grow smoothly from the very earliest stages. XPS data show substantial differences of plasma polymer chemistry in close proximity to the silicon surface manifested in the formation of ${\rm NH}_{{\rm 3}}^{{\rm + }} $ and NO x species which are more abundant in films of HA. We present a possible explanation for these results based upon post‐plasma surface phenomena in the case of HA.