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Deposition of Titania‐containing Diamond‐like Carbon Nanocomposite Films by Sputtering‐assisted Chemical Vapor Deposition
Author(s) -
Chen KuoCheng,
Hong Franklin ChauNan,
Jeng YeauRen
Publication year - 2011
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201000132
Subject(s) - materials science , nanocomposite , chemical vapor deposition , diamond like carbon , chemical engineering , carbon film , sputtering , plasma enhanced chemical vapor deposition , carbon fibers , acetylene , nanoparticle , thin film , argon , sputter deposition , substrate (aquarium) , x ray photoelectron spectroscopy , nanotechnology , composite material , chemistry , composite number , organic chemistry , oceanography , geology , engineering
Abstract Titania‐containing diamond‐like carbon (DLC) nanocomposite films were prepared by sputtering‐assisted plasma chemical vapor deposition. With titanium‐oxygen species sputtered from titania (TiO 2 ) target by argon using a radio‐frequency (RF) power, DLC films were simultaneously grown on the negatively‐biased substrate by plasma chemical vapor deposition of acetylene gas using a pulsed direct‐current (DC) power. By adjusting the Ar/acetylene gas concentration, both TiO 2 and TiC nanoparticles could be incorporated in the DLC films. TiO 2 nanoparticles were mainly formed in the DLC matrix with TiO bond being the dominant bonding for Ti in the DLC films. Furthermore, the amount of TiO 2 and TiC nanoparticles embedded in the DLC film increased with the increase of Ar concentration in the gas. The TiO 2 ‐DLC nanocomposite films deposited at 80% Ar exhibited a high hardness of around 13 GPa at a relatively low stress and, particularly, a fast rate of turning super‐hydrophilic by reaching zero degree of water contact angle under 40 min of ultraviolet irradiation.