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Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO 2 Films
Author(s) -
Šícha Jan,
Novák Ondřej,
Vlček Jaroslav,
Kudláček Pavel
Publication year - 2011
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201000131
Subject(s) - anatase , materials science , pulsed dc , analytical chemistry (journal) , substrate (aquarium) , ion , sputter deposition , cavity magnetron , partial pressure , duty cycle , spectroscopy , sputtering , oxygen , photocatalysis , thin film , chemistry , nanotechnology , voltage , chromatography , biochemistry , oceanography , physics , organic chemistry , quantum mechanics , geology , catalysis
Pulsed dc dual magnetron sputtering was used for preparation of photocatalytic crystalline TiO 2 films. The depositions were performed in an Ar + O 2 gas mixture at a total pressure of 0.9 Pa with an oxygen partial pressure of 0.2 Pa. The maximum substrate surface temperature was 160 °C. Both magnetrons operated in the same asymmetric bipolar mode at the repetition frequency of 100 kHz with a fixed 50% duty cycle, but their operations were shifted by a half of the period. Time‐averaged energy‐resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. A suppression of high‐energy ions in the flux onto the substrate resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO 2 films.