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Morphology of Titanium Nanocluster Films Prepared by Gas Aggregation Cluster Source
Author(s) -
Drábik Martin,
Choukourov Andrei,
Artemenko Anna,
Kousal Jaroslav,
Polonskyi Oleksandr,
Solař Pavel,
Kylián Ondřej,
Matoušek Jindřich,
Pešička Josef,
Matolínová Iva,
Slavínská Danka,
Biederman Hynek
Publication year - 2011
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201000126
Subject(s) - nanoclusters , materials science , x ray photoelectron spectroscopy , titanium , cluster (spacecraft) , argon , cavity magnetron , chemical engineering , nanotechnology , thin film , metallurgy , chemistry , sputtering , organic chemistry , computer science , engineering , programming language
Titanium nanocluster films were prepared using a gas aggregation cluster source based on a planar magnetron following a Haberland concept and using Ar as a working gas. The films were deposited in dependence on the argon pressure inside the cluster source and on the magnetron current. Prior to the analysis, deposited metal nanocluster films were allowed to oxidize in air at room temperature. Selected nanocluster films were annealed in air at 420 °C. The films were studied by TEM, SEM, and AFM in order to describe their morphology and topography. Crystal structure of the nanoclusters was estimated from electron diffraction patterns by SAD analysis. Chemical composition of the film surface was determined by XPS. Special attention was paid to describing the changes in the nanocluster films connected with ageing.