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Analysis and Modeling of Gas‐Phase Processes in a CHF 3 /Ar Discharge
Author(s) -
Barz Jakob P.,
Oehr Christian,
Lunk Achim
Publication year - 2011
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201000095
Subject(s) - fluorocarbon , hydrofluoric acid , fluorine , molecule , plasma , chemistry , hydrogen , chemical reaction , analytical chemistry (journal) , phase (matter) , electron density , atomic physics , anisotropy , inorganic chemistry , organic chemistry , physics , quantum mechanics
Abstract The present work deals with the diagnostics of fluorocarbon plasmas by different experimental methods and complementary numerical analysis of the plasma. The plasma diagnostics were performed with non‐invasive methods. In this paper, we present results obtained by laser‐induced fluorescence and UV absorption measurements. The complementary numerical simulations accounted for the electron–neutral interactions, discharge dynamics, and chemical reactions. Several insights were obtained from the combined experimental and numerical approaches, especially concerning the conclusiveness of the results and previous observations from the literature. As important initial neutral species, CF 3 and H originate from electron collisions with CHF 3 . The atomic hydrogen is responsible for fluorine abstraction reactions which result in the formation of hydrofluoric acid as well as in unsaturated carbon bonds. It was found from the simulations that in the examined discharges, this reaction is the most important channel for the high‐rate production of the CF molecule in the gas phase via ${\rm CF}_{2} + {\rm H}\to {\rm CF} + {\rm HF}$ . For this molecule, no anisotropy in the density was found and the production solely occurs in the gas phase. Contrary to that, the production of CF 2 via the abstraction of fluorine from CF 3 in the gas phase was found to be of less importance for the overall concentration of this molecule. Instead, chemical reactions at the chamber walls which release CF 2 were identified experimentally as major sources. According to the simulations, the unsaturated fluorocarbon molecules react to oligomers, such that the net reaction can be roughly described by $n{\rm CHF}_{3} \to {\rm (CF}_{{\rm 2}} {\rm )}_{n} + n{\rm HF}$ . A good agreement between the simulated and the experimentally observed densities and rates was obtained, which confirms the interpretation of the ongoing plasma‐chemical processes as well as the underlying physical discharge parameters consistently.