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One Step Polymerization of Sulfonated Polystyrene Films in a Dielectric Barrier Discharge
Author(s) -
Merche Delphine,
Hubert Julie,
Poleunis Claude,
Yunus Sami,
Bertrand Patrick,
De Keyzer Philippe,
Reniers François
Publication year - 2010
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201000024
Subject(s) - polystyrene , x ray photoelectron spectroscopy , sulfonic acid , dielectric barrier discharge , plasma polymerization , materials science , fourier transform infrared spectroscopy , styrene , polymerization , polymer chemistry , argon , monomer , analytical chemistry (journal) , chemical engineering , plasma enhanced chemical vapor deposition , polymer , nafion , dielectric , copolymer , thin film , chemistry , organic chemistry , composite material , nanotechnology , optoelectronics , engineering , electrode , electrochemistry
Thin sulfonated polystyrene films were prepared by high pressure PECVD of styrene and trifluoromethane sulfonic acid using a DBD. Argon or helium was used as carrier gas. The chemical composition of the pp‐sulfonated polystyrene was investigated by XPS, SSIMS, and FTIR. XPS shows that the content in sulfonated groups of the films deposited in the discharge can be tuned by varying the temperature of the acid monomer or by improving the HF voltage. Therefore, the films obtained are rich in ionizable groups (more than Nafion). TOF‐SSIMS and FTIR spectra allow to confirm the presence of sulfonic groups (observed on S2p XPS spectra) grafted in the polystyrene matrix.