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Optical Emission Spectroscopy of Argon–Fluorocarbon–Oxygen Fed Atmospheric Pressure Dielectric Barrier Discharges
Author(s) -
Fanelli Fiorenza
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200950012
Subject(s) - fluorocarbon , argon , dielectric barrier discharge , analytical chemistry (journal) , dielectric , atmospheric pressure , spectroscopy , plasma , oxygen , etching (microfabrication) , chemistry , emission spectrum , silicon , microplasma , materials science , spectral line , optoelectronics , nanotechnology , layer (electronics) , oceanography , physics , organic chemistry , quantum mechanics , astronomy , geology , chromatography
Atmospheric pressure filamentary dielectric barrier discharges (FDBDs) fed with argon, a fluorocarbon compound (i.e. CF 4 , C 3 F 8 , C 3 F 6 and c‐C 4 F 8 ) and O 2 were investigated by optical emission spectroscopy (OES). The UV–Vis spectra of the plasma in argon–fluorocarbon mixtures are characterized by narrow signals from Ar atoms, CF 2 and CF fragments and by two continua due to CF 2 +and CF 3 . O 2 addition to the feed gas reduces the emissions of fluorocarbon fragments and results in the appearance of an intense narrow emission at 193 nm and of a broad continuum centred at 290 nm ascribed to ArF and Ar 2 F excimers, respectively. Any signal from F atoms was not detected under the experimental conditions investigated even though the plasma contains F atoms since the dry etching of silicon substrates, a typical process driven by F atoms, was observed. Some possible explanations of this phenomenon are presented.