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Deposition of TiO 2 ‐Based Layer on Textile Substrate: Theoretical and Experimental Study
Author(s) -
Bartoš Petr,
Špatenka Petr,
Volfová Lenka
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200932208
Subject(s) - materials science , textile , layer (electronics) , thread (computing) , plasma enhanced chemical vapor deposition , chemical vapor deposition , composite material , layer by layer , deposition (geology) , substrate (aquarium) , nanotechnology , mechanical engineering , engineering , geology , paleontology , oceanography , sediment
This paper is aimed on both the experimental and the theoretical study of textile surface modification by the plasma‐enhanced chemical vapour deposition (PECVD). In the first part of this paper we describe experimental measurements of the layer profile that is deposited on the surface of a textile thread. The SEM photos of the TiO 2 ‐based layer on fibres showed that the layer thickness changes significantly with the location of the fibre in the fabric. Although both the layer thickness and its profile are crucial quantities for many technical applications, the detailed description of the layer profile experimentally is almost impossible. Therefore, a computer model was developed that enable us to predict the layer structure on the surface of the thread in fabric. This computer model can be used effectively as a sub‐model in other areas of theoretical research.