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Al Top Cathode Deposition on OLED Using DC Magnetron Sputtering
Author(s) -
Gil Tae Hyun,
May Christian,
Lakner Hubert,
Leo Karl,
Keller Stefan
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200932105
Subject(s) - oled , cathode , materials science , sputtering , optoelectronics , sputter deposition , cavity magnetron , deposition (geology) , diode , degradation (telecommunications) , voltage , leakage (economics) , analytical chemistry (journal) , electronic engineering , thin film , electrical engineering , chemistry , nanotechnology , layer (electronics) , paleontology , macroeconomics , chromatography , sediment , economics , biology , engineering
Abstract We fabricated OLEDs having the evaporated Yb cathode and the sputtered Al cathode. Magnetron sputtering is a versatile deposition method, but the energetic particles during sputtering process can damage the underlying organic layers. We applied various process parameters to explain the role of Ar neutrals quoting the former researches. OLEDs showed almost comparable degradation under the discharge voltage of 300 V, but serious degradations were found at the discharge voltage of over 300 V and the low process pressure. The degradations influenced on the lifetime of OLED, and the measured luminance decay was much larger than the OLED having the evaporated Yb cathode due to the high leakage currents.