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Monte Carlo Simulation of Electrons' and Ions' Trajectories in Magnetron Sputtering Systems
Author(s) -
Holik Miroslav,
Bradley James,
BellidoGonzalez Victor,
Monaghan Dermot
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200931905
Subject(s) - monte carlo method , ion , electron , plasma , atomic physics , sputtering , high power impulse magnetron sputtering , computational physics , sputter deposition , materials science , cavity magnetron , physics , collision , nuclear physics , thin film , computer science , nanotechnology , quantum mechanics , statistics , mathematics , computer security
A 3D simulation system has been developed to study electron and ion densities and other plasma parameters in circular and rectangular magnetron sputtering systems. Typically, 10 5 particles of each species are tracked simultaneously for a time period when the plasma parameters' distributions get stabilised. During this period, the particles undergo Lorentz force and different kinds of collisions. The collisions are generated by Monte Carlo method using null‐collision technique.