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Fabrication of Tunable Band Pass Filters for CWDM Applications
Author(s) -
Meister Stefan,
Franke Bülent A.,
Scharfenorth Chris,
Eichler Hans J.
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200931811
Subject(s) - materials science , optics , fabrication , wavelength division multiplexing , optical filter , bandwidth (computing) , optoelectronics , band pass filter , filter (signal processing) , substrate (aquarium) , layer (electronics) , wavelength , telecommunications , engineering , physics , electrical engineering , nanotechnology , medicine , pathology , geology , oceanography , alternative medicine
The paper describes a method to fabricate tunable band pass filters. The thin film optical filters are based on a Fabry‐Perot structure with laterally varying layer thickness. This leads to a variation of the transmission band along the substrate. The filter can be tuned by lateral translation of the filters through an optical beam path. A linear variation of the layer thickness and, therefore, of the transmission band along a 75 mm long substrate could be achieved by choosing proper geometries in the coating chamber. Filters are designed for a centre wavelength of 1300 nm with a −3 dB transmission bandwidth of 2.0 nm. A tuning range of more than 150 nm could be achieved with constant filter losses of ≈0.9 dB. So, the filters are well suited for side band suppression in CWDM applications.
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