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A Comparative Study on the Photocatalytic and Gas Sensing Properties of Pure and N‐doped TiO 2 thin Films
Author(s) -
Delan Annekatrin,
Karuppasamy Alagarsamy,
Schultheiß Eberhard
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200931805
Subject(s) - photocatalysis , materials science , doping , thin film , sputter deposition , nitrogen , sensitivity (control systems) , hydrogen , analytical chemistry (journal) , sputtering , nitrogen gas , chemical engineering , nanotechnology , optoelectronics , catalysis , electronic engineering , chemistry , chromatography , organic chemistry , engineering
A correlation between the photocatalytic efficiency and gas sensitivity has been attempted on pure and N‐doped TiO 2 thin films prepared by pulsed DC magnetron sputtering. The physical properties are studied. The gas sensing behavior in pure and nitrogen doped TiO 2 thin films could be realized at low temperature. The measurements start at 130 °C. The nitrogen doped TiO 2 (3 sccm) has no sensitivity for oxygen. All sensors have sensitivity to hydrogen. If the temperature is increased the sensitivity is increased. All samples show photocatalytic activity. The photocatalytic and gas sensing properties have no significant correlations.