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SiO x ‐Based Gas Barrier Coatings for Polymer Substrates by Atmospheric Pressure Plasma Jet Deposition
Author(s) -
Scopece Paolo,
Viaro Andrea,
Sulcis Roberta,
Kulyk Illya,
Patelli Alessandro,
Guglielmi Massimo
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200931707
Subject(s) - atmospheric pressure plasma , permeation , materials science , deposition (geology) , polymer , plasma enhanced chemical vapor deposition , atmospheric pressure , plasma , chemical engineering , jet (fluid) , analytical chemistry (journal) , thin film , composite material , nanotechnology , chemistry , organic chemistry , membrane , paleontology , biochemistry , physics , quantum mechanics , sediment , engineering , biology , oceanography , geology , thermodynamics
An efficient way to increase the gas barrier properties of polymers is the development of silica barrier coatings; in fact inorganic barrier layers like SiN x and SiO x , usually obtained by PECVD, can decrease the gas permeation through polymeric substrates by several orders of magnitude. Nevertheless, the known costs of vacuum systems and in‐line processing needs have generated increasing interest to develop atmospheric condition alternatives. In this work results on deposition of SiO x on thin layers obtained by an atmospheric plasma jet as well as results on the gas permeation behaviour are presented. Obtained results, on the thickness and composition of the coatings, are evaluated under several deposition conditions.