Premium
SiOx‐Based Multilayer Barrier Coatings Produced by a Single PECVD Process
Author(s) -
Patelli Alessandro,
Vezzù Simone,
Zottarel Lorenzo,
Menin Enrico,
Sada Cinzia,
Martucci Alessandro,
Costacurta Stefano
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200931703
Subject(s) - hexamethyldisiloxane , plasma enhanced chemical vapor deposition , materials science , nanometre , silicon oxide , ceramic , silicon , composite material , nanotechnology , optoelectronics , plasma , silicon nitride , physics , quantum mechanics
Multilayer organic/inorganic gas barrier coatings on plastics are needed for high performance demanding applications from OLEDs to packaging. In order to simplify the multilayer deposition process, we developed a single step vacuum process where silicon oxide‐based PECVD multilayers are obtained by the modulation of the hexamethyldisiloxane (HMDSO) precursor inlet and interfaces are controlled by pumping speed. In this way, depending on O 2 /HMDSO ratio, ‘ceramic’ or ‘polymeric’ layers are deposited, with nanometre control of thickness of layers and interfaces. Permeability behaviour of the multilayer structures obtained is described as a function of the number of layers and their thickness.