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Enhanced AP‐PE‐CVD Process Understanding and Control by Application of Integrated Optical, Electrical and Modelling Diagnostics
Author(s) -
Sawtell David,
Martin Philip A.,
Sheel David W.
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200931608
Subject(s) - spectroscopy , materials science , atmospheric pressure plasma , process control , process (computing) , deposition (geology) , chemical vapor deposition , plasma , analytical chemistry (journal) , near infrared spectroscopy , optoelectronics , optics , chemistry , computer science , environmental chemistry , physics , paleontology , quantum mechanics , sediment , biology , operating system
This paper reports the use of a multiple thrust methodology to monitor the atmospheric pressure plasma‐enhanced chemical vapour deposition (PE‐CVD) of silica films on glass. Simultaneous spectroscopic analysis: optical emission spectroscopy, FT‐IR spectroscopy and in situ near‐infrared laser diode spectroscopy have been combined with electrical measurements to investigate the plasma during the deposition process. The experimentation has been carried out as a chemometric design so as to derive statistical models tying the affected variables to the measured results. Initial results confirm the viability of this approach for improved process understanding, process control and enhanced design capabilities.