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The Influence of Process Parameters on Chemistry, Roughness and Morphology of Siloxane Films Deposited by an Atmospheric Plasma Jet System
Author(s) -
Ramamoorthy Amsarani,
Rahman Mahfujur,
Mooney Damian A.,
Don MacElroy James M.,
Dowling Denis P.
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200931109
Subject(s) - tetraethyl orthosilicate , x ray photoelectron spectroscopy , materials science , atmospheric pressure plasma , siloxane , surface roughness , contact angle , fourier transform infrared spectroscopy , ellipsometry , scanning electron microscope , analytical chemistry (journal) , coating , chemical engineering , jet (fluid) , surface finish , composite material , thin film , plasma , chemistry , nanotechnology , organic chemistry , physics , quantum mechanics , engineering , thermodynamics , polymer
Siloxane coatings were deposited onto Vycor™ glass and silicon substrates from a tetraethyl orthosilicate (TEOS) precursor using the PlasmaStream™ atmospheric plasma jet system. The TEOS precursor was nebulized into He/O 2 plasma and the coating growth rate was controlled by the number of passes of the jet over the ceramic substrates. The system process parameters were systematically varied to study their influence on the coating properties. The chemical properties, surface roughness, and morphology of the 1–200 nm thick coatings were studied as a function of both applied plasma power and TEOS flow rate. The deposited coatings were examined using ellipsometry, contact angle measurement, optical profilometry, Fourier transform infrared spectroscopy (FT‐IR), X‐ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM).