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Film Deposition in the Dielectric Barrier Discharge at Atmospheric Pressure in He/O 2 /HMDSO and He/N 2 O/HMDSO mixtures
Author(s) -
Vinogradov Igor,
Lunk Achim
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200931102
Subject(s) - hexamethyldisiloxane , dielectric barrier discharge , analytical chemistry (journal) , contact angle , atmospheric pressure , x ray photoelectron spectroscopy , dielectric , fourier transform infrared spectroscopy , materials science , deposition (geology) , lissajous curve , chemistry , plasma , chemical engineering , optics , composite material , chromatography , physics , optoelectronics , oceanography , quantum mechanics , engineering , geology , paleontology , sediment , biology
Non‐thermal dielectric barrier discharges (DBD) operated in a parallel plate reactor (6 cm width and 16 cm long) under atmospheric pressure in He/O 2 /HMDSO and He/N 2 O/HMDSO mixtures at different O 2 or N 2 O to HMDSO (hexamethyldisiloxane) ratios and different power are studied. The effective power of the discharge was derived by evaluating the Lissajous–figure on the oscilloscope. Emission spectroscopy and FTIR‐absorption spectroscopy were applied to get information on the reaction products in DBD. The spectroscopic gas analysis was performed at three residence times. The properties of the polymer films deposited on silicon wafers were measured by FTIR‐absorption spectroscopy, AFM and XPS analysis. Surface tension was obtained by contact angle measurements with water. Correlations between parameters of plasma phase with film parameters are discussed.