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Remote Plasma Device for Surface Modification at Atmospheric Pressure
Author(s) -
Reichen Patrick,
Sonnenfeld Axel,
Rudolf von Rohr Philipp
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200930911
Subject(s) - wetting , surface modification , afterglow , atmospheric pressure , materials science , atmospheric pressure plasma , contact angle , plasma , plasma cleaning , analytical chemistry (journal) , environmental science , composite material , meteorology , chemistry , chemical engineering , chromatography , physics , engineering , quantum mechanics , astronomy , gamma ray burst
Abstract Here, a novel atmospheric plasma device is presented, which applies the (remote) afterglow of micro‐barrier discharges. The study evaluates its applicability to surface modification of temperature‐sensitive particulates. As such, cylindrical samples have been placed in the remote treatment zone of the device, and the effects of treatment time and variable gas mixtures on the surface wettability are investigated. Furthermore, the influence of the excess voltage in He discharge with admixtures of O 2 , CO 2 and N 2 and the effect thereof on the water contact angle is described.