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Plasma Processes Combined with Colloidal Lithography to Produce Nanostructured Surfaces for Cell‐Adhesion
Author(s) -
Pistillo Bianca Rita,
Gristina Roberto,
Sardella Eloisa,
Lovascio Sara,
Favia Pietro,
Nardulli Marina,
d'Agostino Riccardo
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200930308
Subject(s) - x ray photoelectron spectroscopy , materials science , contact angle , scanning electron microscope , nanostructure , adhesion , nanotechnology , colloid , surface roughness , surface finish , chemical engineering , lithography , isotropic etching , surface modification , etching (microfabrication) , composite material , optoelectronics , layer (electronics) , engineering
The objective of the present work is to develop nanostructured surfaces by combining low pressure plasma process and colloidal lithography, with the aim of obtaining suitable substrates with predetermined ordered nanometric surface roughness and surface chemical composition. The chemical properties of the resulting nanostructures were characterized by means of X‐ray photoelectron spectroscopy (XPS) and water contact angle (WCA) measurements, their morphology was characterized by scanning electron microscopy (SEM). The effects of both chemistry and morphology on Saos‐2 osteoblast cell behavior was investigated.