Premium
Plasma Enhanced Chemical Vapour Deposition of Nanostructured Fluorocarbon Surfaces
Author(s) -
Sardella Eloisa,
Intranuovo Francesca,
Rossini Pasqua,
Nardulli Marina,
Gristina Roberto,
d'Agostino Riccardo,
Favia Pietro
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200930302
Subject(s) - fluorocarbon , plasma enhanced chemical vapor deposition , substrate (aquarium) , chemical vapor deposition , fluorine , materials science , adhesion , deposition (geology) , nanostructure , chemical engineering , nanotechnology , composite material , metallurgy , paleontology , oceanography , sediment , geology , engineering , biology
Abstract Fluorocarbon coatings have drawn much attention in the biomedical field for their peculiar chemical and topographical characteristics. It is well known that topography and chemistry of a material surface can modulate different cellular responses, including adhesion, proliferation and expression of differentiated phenotypes. In this work, PECVD processes were run and micro/nanostructured fluorocarbon coatings were obtained by varying both gas feed (C 3 F 6 O and C 3 F 6 feeds) and substrate position in an RF (13.56 MHz) reactor. The interesting results demonstrated that the cell behaviour can be dramatically influenced by surface topography of fluorine containing coatings.