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Structure Control in Reactively Sputtered Ag/Cu/(Mn)/O Films
Author(s) -
Pierson JeanFrancois,
Petitjean Carine,
Horwat David
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200930001
Subject(s) - sputtering , copper , materials science , amorphous solid , oxide , silver oxide , nanocomposite , metal , silicon , deposition (geology) , oxygen , metallurgy , thermal stability , inorganic chemistry , chemical engineering , thin film , analytical chemistry (journal) , chemistry , nanotechnology , crystallography , paleontology , organic chemistry , sediment , engineering , biology , chromatography
Copper‐ and silver‐based oxides were deposited on glass and silicon substrates by reactive sputtering in various Ar/O 2 mixtures. The deposition conditions range for paramelaconite synthesis is discussed. The structure of silver oxide films is discussed as a function of the oxygen flow rate introduced into the deposition chamber. Ag/Cu/O films were deposited using either co‐sputtering of silver and copper targets or sputtering of composite targets (Ag 50 Cu 50 and Ag 60 Cu 40 ). The control of the oxygen and/or the silver content allows the formation of various kinds of structures: X‐ray amorphous, metal/oxide nanocomposites or silver/copper oxides. Finally, the effect of copper and/or manganese addition in silver‐based oxides on their thermal stability is presented.