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An Open Argon Dielectric Barrier Discharge VUV‐Source
Author(s) -
Sobottka Axel,
Drößler Lutz,
Lenk Martin,
Prager Lutz,
Buchmeiser Michael R.
Publication year - 2010
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200900145
Subject(s) - argon , dielectric barrier discharge , materials science , dielectric , irradiation , radiation , atmospheric pressure , glow discharge , optoelectronics , generator (circuit theory) , optics , analytical chemistry (journal) , power (physics) , plasma , chemistry , atomic physics , physics , chromatography , meteorology , quantum mechanics , nuclear physics
An argon vacuum ultra violet (VUV) light lamp was built. The radiation source is driven by an RF generator in continuous wave (cw) mode at frequencies of 680 and 840 kHz, respectively. An optimum design was developed for an atmospheric pressure glow discharge in an open system. The UV power of the radiation source was measured and the time response of the dielectric discharge was investigated. Finally, the emission spectra were measured under different conditions. All components of the lamp were designed in way that they meet the requirements for a practical setup for the irradiation of miscellaneous samples for both surface modification and activation.