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Optical Characterization of Plasma‐Deposited SiO 2 ‐Like Layers on Anisotropic Polymeric Substrates
Author(s) -
Aresta Gianfranco,
Premkumar Peter Antony,
Starostin Sergey A.,
de Vries Hindrik,
van de Sanden Mauritius C. M.,
Creatore Mariadriana
Publication year - 2010
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200900109
Subject(s) - materials science , ellipsometry , refractive index , characterization (materials science) , anisotropy , layer (electronics) , plasma , thin film , optics , composite material , analytical chemistry (journal) , optoelectronics , nanotechnology , chemistry , physics , chromatography , quantum mechanics
In this paper, the characterization of the optical anisotropy of poly(ethylene‐2,6‐naphthalate) (PEN) by means of Transmission Generalized Ellipsometry coupled with reflection multi‐angle Spectroscopic Ellipsometry (SE) measurements is presented. This study is functional to the determination of the refractive index of atmospheric pressure plasma‐deposited SiO 2 ‐like layers deposited on PEN. The effect of the plasma duty cycle (DC) on the film properties is investigated. From the analysis of the optical properties, complemented with chemical and morphological studies, it is concluded that the increase in DC is responsible for the layer densification process, eventually causing an improvement in the PEN/SiO 2 system barrier properties.