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Advantages of a Pulsed Electrical Excitation Mode on the Corrosion Performance of Organosilicon Thin Films Deposited on Aluminium Foil by Atmospheric Pressure Dielectric Barrier Discharge
Author(s) -
Boscher Nicolas D.,
Choquet Patrick,
Duday David,
Verdier Stéphane
Publication year - 2010
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200900094
Subject(s) - organosilicon , hexamethyldisiloxane , materials science , x ray photoelectron spectroscopy , dielectric barrier discharge , atmospheric pressure , thin film , analytical chemistry (journal) , scanning electron microscope , aluminium , dielectric , composite material , chemical engineering , chemistry , plasma , optoelectronics , nanotechnology , organic chemistry , polymer chemistry , oceanography , physics , quantum mechanics , engineering , geology
Atmospheric pressure dielectric barrier discharge deposition of organosilicon thin films on aluminium foils was investigated for different electrical excitations. The plasma reactor was fed with nitrogen and hexamethyldisiloxane as film precursor. Scanning electron microscopy observations and secondary ion mass spectrometry associated with X‐ray photoelectron spectroscopy showed how the modulation of the electrical excitation can affect the morphology and the chemistry of the coatings. The corrosion behaviour of the films obtained was characterised by means of electrochemical techniques. Relationships between the electrical excitation and the electrochemical properties of the films are reported and these results have been correlated with the morphology and chemistry modifications of the films.