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High Quality SiO 2 ‐like Layers by Large Area Atmospheric Pressure Plasma Enhanced CVD: Deposition Process Studies by Surface Analysis
Author(s) -
Premkumar Peter Antony,
Starostin Sergey A.,
de Vries Hindrik,
Paffen Roger M. J.,
Creatore Mariadriana,
Eijkemans Tom J.,
Koenraad Paul M.,
de Sanden Mauritius C. M. van
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200900033
Subject(s) - deposition (geology) , polymer , materials science , radical , atmospheric pressure plasma , atmospheric pressure , chemical engineering , plasma , analytical chemistry (journal) , chemistry , composite material , chromatography , organic chemistry , paleontology , physics , oceanography , quantum mechanics , sediment , engineering , biology , geology
This work reports on the main competing processes and their contribution to the properties of SiO 2 layers on polymers in large area AP‐PE‐CVD from ArN 2 O 2 ‐HMDSO mixtures. The detailed space resolved surface analysis on the statically deposited films showed smooth SiO x films in the vicinity of the gas injection, as deposited by HMDSO radicals. At the gas effluent, due to HMDSO depletion, non‐depositing species interact with the polymer and induce rough deposits with high carbon content. The competition of plasma–polymer surface interaction with HMDSO radicals deposition, is further confirmed from the analysis of films grown on polymers with a “protecting” layer and with reverse gas flow direction. Under web roll conditions, HMDSO radicals deposition is dominant, resulting in high quality SiO x layers along the whole electrode length.