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Modeling and Simulation of Fast Neutral Beam Sources for Materials Processing
Author(s) -
Economou Demetre J.
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200900005
Subject(s) - beam (structure) , etching (microfabrication) , plasma processing , deposition (geology) , materials science , kinetic energy , ion beam , materials processing , plasma , ion , optics , nanotechnology , chemistry , physics , process engineering , engineering , nuclear physics , geology , paleontology , organic chemistry , layer (electronics) , quantum mechanics , sediment
Abstract Fast (kinetic energy of 10 to some 100 eV) neutral beams can be used for etching, deposition or surface modification, without charging damage that may occur in conventional plasma processing of materials. This paper provides an overview of the modeling and simulation approaches applicable to neutral beam sources. Neutral beam sources based on both volume and surface neutralization of ions are discussed, with emphasis on the latter.