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Plasma Process. Polym. 7/2008
Author(s) -
GirardLauriault PierreLuc,
Desjardins Patrick,
Unger Wolfgang E. S.,
Lippitz Andreas,
Wertheimer Michael R.
Publication year - 2008
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200890012
Subject(s) - schematic , plasma , dielectric barrier discharge , polymer , materials science , spectral line , cover (algebra) , fourier transform infrared spectroscopy , xanes , polymer chemistry , dielectric , analytical chemistry (journal) , chemistry , chemical engineering , composite material , physics , organic chemistry , engineering , optoelectronics , electrical engineering , mechanical engineering , quantum mechanics , astronomy
Back Cover: The cover illustration shows a schematic diagram of the dielectric barrier discharge system (top left) used to deposit plasma polymer films with high concentrations of nitrogen‐containing functional groups. Also shown are NEXAFS spectra (top right) and FTIR spectra (bottom left) used for semiquantitative analysis of nitrile functionalities (bottom right), where excellent agreement may be noted. Further details can be found in the article by P.‐L. Girard‐Lauriault, P. Desjardins, W. E. S. Unger, * A Lippitz, and M. R. Wertheimer * on page 631.