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Plasma Process. Polym. 7/2008
Author(s) -
Vandencasteele Nicolas,
Nisol Bernard,
Viville Pascal,
Lazzaroni Roberto,
Castner David G.,
Reniers François
Publication year - 2008
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200890010
Subject(s) - x ray photoelectron spectroscopy , tetrafluoroethylene , radical , materials science , etching (microfabrication) , contact angle , adsorption , oxygen , surface modification , plasma , polymer chemistry , chemical engineering , plasma etching , analytical chemistry (journal) , composite material , chemistry , layer (electronics) , organic chemistry , polymer , physics , quantum mechanics , engineering , copolymer
Front Cover: Poly(tetrafluoroethylene) (PTFE) submitted to a post‐discharge low‐pressure oxygen RF plasma treatment exhibits, at high DC bias, superhydrophobic behavior. An alveolar surface structure resulting from chemical etching of PTFE by oxygen radicals is revealed by AFM. XPS shows that such surfaces are resistant to the adsorption of proteins such as BSA. Further details can be found in the article by N. Vandencasteele, B. Nisol, P. Viville, R. Lazzaroni, D. G. Castner, and F. Reniers * on page 661.