Premium
Comparative Study of the Superhydrophobic‐Modification of Silicone Rubber Surfaces by CF 4 ICP and CCP
Author(s) -
Gao SongHua,
Zhou KeSheng,
Lei MingKai,
Wen LiShi
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200800213
Subject(s) - contact angle , silicone rubber , x ray photoelectron spectroscopy , surface modification , materials science , surface roughness , etching (microfabrication) , scanning electron microscope , plasma etching , analytical chemistry (journal) , inductively coupled plasma , surface finish , silicone , composite material , plasma , chemical engineering , chemistry , organic chemistry , physics , layer (electronics) , quantum mechanics , engineering
Super‐hydrophobic surface‐modification of silicone rubber (SIR) as an outdoor insulator by CF 4 radio frequency (RF) inductively coupled plasma (ICP) and capacitively coupled plasma (CCP) has been studied. X‐Ray photoelectron spectroscopy, atomic force microscopy, and static contact angle measurements were employed to characterize the changes of the surface chemical composition, topography, and hydrophobicity. The results show that etching or ablation and fluorination are parallel and competitive during both treatments. The improvement of hydrophobicity is ascribed to the coaction of the increase of surface roughness and the introduction of fluoric groups (CCF n ) or structures (SiF and SiF 2 ). It is also found that the ratio of [SiF]/[CF] and the increase of surface roughness of the SIR treated by CCP are higher than that by ICP, which leads to a greater hydrophobic modification effect by the CCP process.