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Process Intensification in Vacuum Arc Deposition Setups
Author(s) -
Baranov Oleg,
Romanov Maxim
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200800131
Subject(s) - vacuum arc , arc (geometry) , magnetic field , current (fluid) , electromagnetic coil , plasma , materials science , substrate (aquarium) , field (mathematics) , ion current , plasma arc welding , nuclear magnetic resonance , chemistry , optics , electrical engineering , physics , mechanical engineering , engineering , nuclear physics , oceanography , mathematics , quantum mechanics , pure mathematics , geology
The possibility to intensify the deposition process by application of a magnetic field generated by two additional magnetic coils placed under a substrate exposed to vacuum arc plasma has been investigated. When both additional coils generate a magnetic field matched with the field generated by guiding and focusing the coils of a vacuum arc source, the substrate ion current can be increased by up to 4.4% of the arc current, i.e., 1.26 times compared to a system without the additional magnetic field. A monotonous decrease of arc current depending on the currents in both additional coils is observed. When additional coils are powered oppositely and the magnetic field generated by one additional coil is directed according to the magnetic field of coils of the arc source, the substrate ion current can be decreased to 2.7% of the arc current.