Premium
Pulsed i‐PVD of Dielectric Nanodot Arrays Using a Nanoporous Template
Author(s) -
Zhong Xiaoxia,
Wu Xiaochen,
Ostrikov Kostya Ken
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200800129
Subject(s) - nanodot , materials science , nanopore , nanoporous , duty cycle , dielectric , nanolithography , silicon , substrate (aquarium) , optoelectronics , nanotechnology , biasing , voltage , fabrication , medicine , oceanography , physics , alternative medicine , pathology , quantum mechanics , geology
The results of multi‐scale numerical simulations of pulsed i‐PVD template‐assisted nanofabrication of ZnO nanodot arrays on a silicon substrate are presented. The ratios and spatial distributions of the ion fluxes deposited on the lateral and bottom surfaces of the nanopores are computed as a function of the external bias and plasma parameters. The results show that the pulsed bias plays a significant role in the ion current distribution inside the nanopores. The results of numerical experiments of this work suggest that by finely adjusting the pulse voltage, the pulse duration and the duty cycle of the external pulsed bias, the nanopore clogging can be successfully avoided during the deposition and the shapes of the deposited ZnO nanodots can be effectively controlled.