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Pulsed Plasma Deposition from Vinyltrimethylsilane/Oxygen Mixtures
Author(s) -
Francescangeli Adriano,
Palumbo Fabio,
d'Agostino Riccardo,
Defranoux Christophe
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200800066
Subject(s) - plasma , duty cycle , deposition (geology) , capacitive sensing , oxygen , materials science , layer (electronics) , gas composition , analytical chemistry (journal) , kinetics , work (physics) , chemical engineering , chemistry , nanotechnology , voltage , chromatography , organic chemistry , thermodynamics , electrical engineering , paleontology , physics , quantum mechanics , sediment , biology , engineering
In this work, SiO 2 ‐like films have been deposited in a capacitive coupled parallel plate reactor using low pressure, pulsed O 2 /VTMS plasmas. The influence of the duty cycle and of the period on the structure of films at fixed gas feed composition are shown. It has been demonstrated that the chemical process developed depends very much on the modulation parameters, and that the OFF time significantly contributes to the overall process kinetics. Furthermore, some indication have been obtained on the possibility of getting multistack gas barrier coatings by alternating organic and inorganic layers, in which the inorganic layer is deposited by means of modulated plasma processes based on vinyltrimethylsilane feeds.