Premium
Power Supply for Plasma Torches Based on a Class‐E Amplifier Configuration
Author(s) -
PérezMartínez José A.,
PeñaEguiluz Rosendo,
LópezCallejas Régulo,
MercadoCabrera Antonio,
Alvarado Raúl Valencia,
Barocio Samuel R.,
de la PiedadBeneitez Aníbal
Publication year - 2008
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200800026
Subject(s) - inductor , capacitor , plasma , amplifier , materials science , electrical engineering , voltage , rf power amplifier , electrical impedance , power (physics) , shunt (medical) , optoelectronics , atmospheric pressure plasma , engineering , physics , cmos , medicine , quantum mechanics , cardiology
A new RF power supply intended for low‐power plasma torches is presented. It is based on a class‐E amplifier, modified on the principle of a parallel LC resonant circuit, and is used here to supply the so‐called ‘plasma needle’. The latter is matched with a shunt inductor, and both are connected in parallel to the resonant capacitor C . This configuration is particularly useful for the control of stable discharge characteristics, for example, to resist naturally occurring variations in the load impedance, by providing the high voltage necessary to ignite and maintain the plasma. The overall system has been tested at atmospheric pressure by producing glow discharges in flows of helium and argon. We present early results that describe the device's characteristics.