Premium
Influence of Impinging Ion Energy on the Bonding and Mechanical Characteristics of DLC Films Deposited by Microwave ECR Plasma CVD
Author(s) -
Singh Sujit,
Pandey Mukesh,
Kishore Ramaswamy,
Chand Naresh,
Dash Sitaram,
Tyagi Ashok,
Patil Dinkar
Publication year - 2008
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200800011
Subject(s) - nanoindentation , materials science , substrate (aquarium) , raman spectroscopy , ion , deposition (geology) , analytical chemistry (journal) , thin film , composite material , plasma , nanotechnology , chemistry , optics , paleontology , oceanography , physics , organic chemistry , chromatography , quantum mechanics , sediment , biology , geology
DLC films were deposited on Si(111) substrates using CH 4 /Ar gas and microwave ECR plasma CVD processes. The energy of the ions impinging on the substrate during deposition was varied by changing the rf self bias voltage developed on the substrate. The bonding characteristics of the deposited films were investigated using FTIR and Raman spectroscopy, and mechanical properties were measured by nanoindentation and nanoscratch tests. The results obtained from different characterization techniques are correlated and explained on the basis of existing growth models for DLC films. Our studies indicate that the energy of the ions impinging on the substrates has a strong influence on the bonding characteristics and mechanical properties of the films.