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Characterization of the Plasma Properties of a Reverse Polarity Planar Magnetron Operated as an Ion Source
Author(s) -
Ranjan Mukesh,
Kalathiparambil Kishor K.,
Vaghela Naresh P.,
Mukherjee Subroto
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200732323
Subject(s) - langmuir probe , anode , faraday cup , ion , materials science , cavity magnetron , ion source , plasma , ion beam deposition , sputter deposition , analytical chemistry (journal) , atomic physics , ion beam , faraday cage , optoelectronics , plasma diagnostics , sputtering , chemistry , thin film , nanotechnology , magnetic field , physics , electrode , organic chemistry , quantum mechanics , chromatography
In the present study the possibility of using a planar magnetron configuration as an ion source has been studied by inverting the polarity of a DC magnetron. The characterization of the plasma properties has been performed under various operating conditions using retarding potential analyzer (RPA), Langmuir probe, and Faraday cup. The ion energy is 291 eV at 490 V anode voltage and pressure of 5 × 10 −4 mbar measured using a RPA. Also the ion density is ∼10 12 per cm 3 as measured by Langmuir probe. Spread in energy is less (∼3 eV) at lower pressure and at higher anode voltage. This configuration behaves very well like an ion source and can be used for sputter cleaning of substrates and for ion beam‐assisted deposition applications.