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Plasma Profiles of Inductively Coupled Plasmas Sustained with Low‐Inductance Internal Antenna
Author(s) -
Takenaka Kosuke,
Sera Takashi,
Ebe Akinori,
Setsuhara Yuichi
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200732319
Subject(s) - antenna (radio) , inductively coupled plasma , plasma , loop antenna , materials science , inductive coupling , inductance , atomic physics , antenna factor , voltage , physics , dipole antenna , electrical engineering , engineering , quantum mechanics
We have investigated plasma profiles of inductively coupled plasmas (ICPs) sustained with a single low‐inductance antenna (LIA) in terms of plasma density, electron temperature, and potential formation to understand effects of plasma properties in generation region (near antenna) and those in downstream region. The densities of plasmas sustained with a single antenna were as high as 10 12 cm −3 near the antenna and had almost uniform profiles in the downstream region away from the single antenna about 100 mm. The floating potential as low as 5–6 V was achieved by effective suppression of electrostatic coupling due to lowering antenna RF voltage. The plasma density profile was independent of RF power.