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Colloidal Monolayers Combined with Cold Plasmas: A Versatile Nanofabrication Tool
Author(s) -
Sardella Eloisa,
Lovascio Sara,
Favia Pietro,
d'Agostino Riccardo
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200732105
Subject(s) - materials science , nanolithography , nanotechnology , polystyrene , polymer , plasma etching , lithography , plasma , colloidal crystal , monolayer , colloid , nanoparticle , etching (microfabrication) , chemical engineering , fabrication , composite material , optoelectronics , layer (electronics) , medicine , alternative medicine , physics , pathology , quantum mechanics , engineering
Abstract New challenges of life science research make nanostructured polymeric surfaces, chemically and spatially resolved, very attractive for biomedical purposes. High costs and unsuitability of polymers processed by the traditional techniques lead to new research routes. In this work, the production of nanostructured polystyrene substrates combining Colloidal lithography and cold plasma processes is shown. Colloidal nanoparticles self‐assemble into a regular lattice on the polymers, and are used as physical masks in lithographic processes. Ammonia plasma treatments have been used to improve the suitability of the polymer surface for the entire process. Plasma etching with Ar/O 2 discharges have been applied to transfer the patterns.