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Spectroscopic Diagnostics of DBD Remote Plasma in Ar/Fluorocarbon Mixtures—Correlation Between Plasma Parameters and Thin Film Properties
Author(s) -
Vinogradov Igor,
Shakhatre Mahmud,
Lunk Achim
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200731908
Subject(s) - dielectric barrier discharge , x ray photoelectron spectroscopy , analytical chemistry (journal) , fluorocarbon , fourier transform infrared spectroscopy , materials science , plasma , spectroscopy , fourier transform spectroscopy , wafer , infrared spectroscopy , absorption (acoustics) , absorption spectroscopy , dielectric , chemistry , optoelectronics , chemical engineering , optics , organic chemistry , physics , quantum mechanics , engineering , composite material
Fourier transform infrared (FT‐IR) and broad band ultraviolet (UV) absorption spectroscopy diagnostics were applied to get information on the reaction products and especially the CF 2 absolute densities in dielectric barrier discharge (DBD) remote plasma. From the above‐mentioned diagnostics methods only stable products in a DBD remote plasma could be identified. The spectroscopic analysis was performed in the volume which is several millimetres (up to 10 mm) far away from the active zone of the DBD. Atomic content and cross‐linking effects of fluorocarbon polymer films deposited on silicon wafer were analysed by applying of X‐ray photoelectron spectroscopy (XPS) and FT‐IR absorption spectroscopy.