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Thin TiCN Films Prepared by Hybrid Magnetron‐Laser Deposition
Author(s) -
Kocourek Tomas,
Jelinek Miroslav,
Kadlec Jaromir,
Popov Cyril,
Santoni Antonino
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200731603
Subject(s) - materials science , thin film , x ray photoelectron spectroscopy , cavity magnetron , substrate (aquarium) , sputter deposition , argon , titanium , deposition (geology) , glow discharge , analytical chemistry (journal) , pulsed laser deposition , fluence , carbon film , sputtering , laser , optoelectronics , metallurgy , chemical engineering , optics , nanotechnology , plasma , chemistry , oceanography , engineering , biology , paleontology , chromatography , quantum mechanics , physics , organic chemistry , sediment , geology
Titanium carbonitride thin films were prepared by hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition. Carbon and titanium species were simultaneously deposited on the same rotated Si substrate. Films were fabricated at room substrate temperature in argon–nitrogen ambient atmosphere, for laser fluence of 15 J · cm −2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Films were studied by XRD and glow discharge optical emission spectroscopy (GDOES). Mechanical and electronic properties (XPS) were also measured.