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Photoactivated Properties of TiO 2 Films Prepared by Magnetron Sputtering
Author(s) -
Heřman David,
Šícha Jan,
Musil Jindřich
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200731303
Subject(s) - materials science , sputtering , irradiation , sputter deposition , contact angle , cavity magnetron , optoelectronics , diffraction , thin film , chemical engineering , analytical chemistry (journal) , composite material , optics , nanotechnology , chemistry , organic chemistry , physics , engineering , nuclear physics
Abstract This article reports on photoactivity of sputtered TiO 2 films induced by UV irradiation. TiO 2 films were prepared by dc pulsed reactive magnetron sputtering using a dual magnetron operated in bipolar mode and equipped with Ti targets. The photoactivity of TiO 2 films, characterized by the water droplet contact angle (WDCA) on the film surface after UV irradiation, was evaluated and discussed in detail. The structure of TiO 2 film was measured using X‐ray diffraction and surface morphology using AFM. A sharp decrease in WDCA to ∼10° has been observed for optimal sputtering conditions. Possibility of low‐temperature sputtering (<90°) of photoactive TiO 2 films on heat sensitive substrates has been introduced.