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Determination of Plasma Parameters during Deposition of ZnO Films by Ceramic and Metallic Targets and Correlation with Film Properties
Author(s) -
Wiese Ruben,
Kersten Holger,
Hannemann Mario,
Sittinger Volker,
Ruske Florian,
Menner Richard
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200731302
Subject(s) - deposition (geology) , materials science , substrate (aquarium) , ceramic , sputter deposition , thin film , plasma , sputtering , langmuir probe , characterization (materials science) , analytical chemistry (journal) , nanotechnology , optoelectronics , chemical engineering , composite material , chemistry , plasma diagnostics , engineering , paleontology , oceanography , physics , quantum mechanics , sediment , biology , geology , chromatography
While magnetron sputtering is a commonly used tool for the deposition of thin films in research and production, the development of suitable models describing film growth on the substrate progresses slowly. One of the major reasons is the complexity of the process, in which energy and particles are delivered to the substrate in a variety of ways. Nevertheless, these effects are essential for film growth and will determine the quality of obtained films. In this article, an example for the characterization of a deposition process with a comparably simple and cost effective method is shown. The total energy flux to the substrate was measured by a thermal probe; plasma parameters were studied by means of Langmuir probe measurements.