Premium
Diagnostics of SiCOH‐Film‐Deposition in the Dielectric Barrier Discharge at Atmospheric Pressure
Author(s) -
Vinogradov Igor,
Zimmer Daniel,
Lunk Achim
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200731202
Subject(s) - dielectric barrier discharge , materials science , atmospheric pressure , analytical chemistry (journal) , contact angle , x ray photoelectron spectroscopy , dielectric , wafer , deposition (geology) , absorption (acoustics) , thin film , absorption spectroscopy , spectroscopy , chemistry , composite material , chemical engineering , optoelectronics , nanotechnology , optics , organic chemistry , paleontology , sediment , engineering , biology , geology , physics , quantum mechanics , oceanography
The paper studies non‐thermal dielectric barrier discharges (DBD) operated in a parallel plate reactor (6 cm width and 16 cm long) under atmospheric pressure in Ar/HMDSO and Ar/HMDSO/O 2 mixtures at different O 2 to HMDSO ratio and different power. Emission spectroscopy and FT‐IR absorption spectroscopy were applied to get information on the reaction products in the DBD. The spectroscopic analysis was performed at three residence time. The properties of the polymer films deposited on silicon wafer were measured by FT‐IR absorption spectroscopy, AFM and XPS analysis. Surface tension was obtained from contact angle measurements with water and CJ 2 H 2 . The correlation between properties of plasma and the results of thin film diagnostics has been investigated.