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Atmospheric Pressure PECVD of Fluorocarbon Coatings from Glow Dielectric Barrier Discharges
Author(s) -
Fanelli Fiorenza,
Fracassi Francesco,
d'Agostino Riccardo
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200731201
Subject(s) - fluorocarbon , plasma enhanced chemical vapor deposition , helium , analytical chemistry (journal) , deposition (geology) , hydrogen , materials science , dielectric barrier discharge , dielectric , atmospheric pressure , phase (matter) , plasma , glow discharge , chemistry , thin film , nanotechnology , composite material , optoelectronics , chromatography , organic chemistry , meteorology , paleontology , physics , quantum mechanics , sediment , biology
The deposition of fluorocarbon films from GDBDs fed with helium–hexafluoropropene (He‐C 3 F 6 ) and helium–octafluoropropane–hydrogen (He‐C 3 F 8 ‐H 2 ) mixtures was investigated. The effect of several parameters was evaluated in order to clarify both the GDBD existence domain and film characteristics. He‐C 3 F 6 GDBDs allowed to obtain films with an F/C ratio of 1.5 and to achieve deposition rates up to 35 nm · min −1 . By changing the H 2 content in He‐C 3 F 8 ‐H 2 fed GDBDs, it was possible to vary the crosslinking degree to tune the F/C ratio of the coatings and to change the deposition rate which was maximized for an H 2 /C 3 F 8 ratio close to 1. A spectroscopic investigation of the plasma phase is also presented.