Atmospheric Pressure PECVD of Fluorocarbon Coatings from Glow Dielectric Barrier Discharges | Zendy

Fanelli Fiorenza | Zendy; Fracassi Francesco | Zendy; d'Agostino Riccardo | Zendy

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Atmospheric Pressure PECVD of Fluorocarbon Coatings from Glow Dielectric Barrier Discharges

Author(s) -

Fanelli Fiorenza,

Fracassi Francesco,

d'Agostino Riccardo

Publication year - 2007

Publication title -

plasma processes and polymers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.644

H-Index - 74

eISSN - 1612-8869

pISSN - 1612-8850

DOI - 10.1002/ppap.200731201

Subject(s) - fluorocarbon , plasma enhanced chemical vapor deposition , helium , analytical chemistry (journal) , deposition (geology) , hydrogen , materials science , dielectric barrier discharge , dielectric , atmospheric pressure , phase (matter) , plasma , glow discharge , chemistry , thin film , nanotechnology , composite material , optoelectronics , chromatography , organic chemistry , meteorology , paleontology , physics , quantum mechanics , sediment , biology

The deposition of fluorocarbon films from GDBDs fed with helium–hexafluoropropene (He‐C 3 F 6 ) and helium–octafluoropropane–hydrogen (He‐C 3 F 8 ‐H 2 ) mixtures was investigated. The effect of several parameters was evaluated in order to clarify both the GDBD existence domain and film characteristics. He‐C 3 F 6 GDBDs allowed to obtain films with an F/C ratio of 1.5 and to achieve deposition rates up to 35 nm · min −1 . By changing the H 2 content in He‐C 3 F 8 ‐H 2 fed GDBDs, it was possible to vary the crosslinking degree to tune the F/C ratio of the coatings and to change the deposition rate which was maximized for an H 2 /C 3 F 8 ratio close to 1. A spectroscopic investigation of the plasma phase is also presented.

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